Federal award
PALO ALTO RESEARCH CENTER LLC
FA865010C7079
Contract
Obligated and Ceiling
- Obligated (net)
- $4,355,133.00
- Ceiling (potential value, not spending)
- $4,355,133.00
- Current value
- $4,355,133.00
- Gross positive obligations
- $4,355,133.00
Obligated is what the government has committed, net of de-obligations. The ceiling is the most the award or vehicle could ever reach; it is shown separately and never added to, or compared as, spending.
Award Details
- Recipient
- PALO ALTO RESEARCH CENTER LLC · S2VPZDS5W6M3
- Owner company
- SRI InternationalBasis direct: the recipient is the company's own reviewed UEI.
- Reported parent
- XEROX CORPORATION · JB4NTVR9XMN4
- Awarding agency
- Department of War · sub-agency 5700 · office FA8650
- Funding agency
- Department of War · sub-agency 97AE
- Product or service (PSC)
- AC11 · NATIONAL DEFENSE R&D SERVICES; DEPARTMENT OF DEFENSE - MILITARY; BASIC RESEARCH
- Industry (NAICS)
- 541712 · RESEARCH AND DEVELOPMENT IN THE PHYSICAL, ENGINEERING, AND LIFE SCIENCES (EXCEPT BIOTECHNOLOGY)
- PIID
- FA865010C7079
- Award type code
- D
- Actions
- 8 · Sep 30, 2010 to Jan 30, 2012
- Why it is listed
- gross positive obligations of $100k or more (contracts); reviewed company, $10k or more
Action History8
| Date | FY | Mod | Action type | Obligation | Company in company totals |
|---|---|---|---|---|---|
| Jan 30, 2012 | FY2012 | P00007 | C | $410,282.00 | |
| Dec 9, 2011 | FY2012 | P00006 | C | $581,705.00 | |
| Nov 10, 2011 | FY2012 | P00005 | B | $33,718.00 | |
| Aug 24, 2011 | FY2011 | P00004 | M | $0.00 | |
| Mar 14, 2011 | FY2011 | P00003 | C | $2,272,746.00 | |
| Dec 30, 2010 | FY2011 | P00002 | C | $318,013.00 | |
| Nov 16, 2010 | FY2011 | P00001 | C | $638,669.00 | |
| Sep 30, 2010 | FY2010 | 0 | — | $100,000.00 |
Newest first. Every obligation is shown as reported, including zero and negative (de-obligation) actions. Award lists belong to the company of the latest action; company totals credit each action to the company named on that row, so a note marks rows where the two differ.