Federal award
PLASMA PROCESSES, LLC
FA910115C0003
ContractSBIR/STTR SR2
Obligated and Ceiling
- Obligated (net)
- $1,025,999.34
- Ceiling (potential value, not spending)
- $1,025,999.34
- Current value
- $1,025,999.34
- Gross positive obligations
- $1,025,999.34
Obligated is what the government has committed, net of de-obligations. The ceiling is the most the award or vehicle could ever reach; it is shown separately and never added to, or compared as, spending.
Award Details
- Recipient
- PLASMA PROCESSES, LLC · KAWTP8XNFEK9
- Owner company
- Not a reviewed companyNo reviewed company owns this recipient.
- Reported parent
- PLASMA PROCESSES, LLC · KAWTP8XNFEK9
- Awarding agency
- Department of War · sub-agency 5700 · office FA9101
- Funding agency
- Department of War · sub-agency 5700
- Product or service (PSC)
- AD95 · R&D- DEFENSE OTHER: OTHER (OPERATIONAL SYSTEMS DEVELOPMENT)
- Industry (NAICS)
- 541712 · RESEARCH AND DEVELOPMENT IN THE PHYSICAL, ENGINEERING, AND LIFE SCIENCES (EXCEPT BIOTECHNOLOGY)
- PIID
- FA910115C0003
- Award type code
- D
- Actions
- 9 · Feb 17, 2015 to Jan 29, 2021
- Why it is listed
- gross positive obligations of $100k or more (contracts); SBIR/STTR award
Action History9
| Date | FY | Mod | Action type | Obligation | Company in company totals |
|---|---|---|---|---|---|
| Jan 29, 2021 | FY2021 | P00008 | M | $0.00 | — |
| Oct 3, 2019 | FY2020 | P00007 | B | $0.00 | — |
| Apr 25, 2019 | FY2019 | P00006 | C | $51,000.00 | — |
| Jan 17, 2019 | FY2019 | P00005 | B | $0.00 | — |
| Apr 9, 2018 | FY2018 | P00004 | D | $0.00 | — |
| Jun 27, 2017 | FY2017 | P00003 | B | $225,000.00 | — |
| Feb 14, 2017 | FY2017 | P00002 | B | $0.00 | — |
| Mar 30, 2016 | FY2016 | P00001 | C | $365,606.46 | — |
| Feb 17, 2015 | FY2015 | 0 | — | $384,392.88 | — |
Newest first. Every obligation is shown as reported, including zero and negative (de-obligation) actions. Award lists belong to the company of the latest action; company totals credit each action to the company named on that row, so a note marks rows where the two differ.