Federal award
ADVANCED FINISHING SYSTEMS, INC.
HSCG3812C808001
Contract
Obligated and Ceiling
- Obligated (net)
- $287,288.75
- Ceiling (potential value, not spending)
- $287,288.75
- Current value
- $287,288.75
- Gross positive obligations
- $355,095.00
Obligated is what the government has committed, net of de-obligations. The ceiling is the most the award or vehicle could ever reach; it is shown separately and never added to, or compared as, spending.
Award Details
- Recipient
- ADVANCED FINISHING SYSTEMS, INC. · ZNQ4DMNFX5K7
- Owner company
- Not a reviewed companyNo reviewed company owns this recipient.
- Reported parent
- ADVANCED FINISHING SYSTEMS, INC. · ZNQ4DMNFX5K7
- Awarding agency
- Department of Homeland Security · sub-agency 7008 · office 00038
- Funding agency
- Department of Homeland Security · sub-agency 7008
- Product or service (PSC)
- J095 · MAINT/REPAIR/REBUILD OF EQUIPMENT- METAL BARS, SHEETS, AND SHAPES
- Industry (NAICS)
- 332813 · ELECTROPLATING, PLATING, POLISHING, ANODIZING, AND COLORING
- PIID
- HSCG3812C808001
- Award type code
- D
- Actions
- 9 · Jan 3, 2012 to Apr 23, 2015
- Why it is listed
- gross positive obligations of $100k or more (contracts)
Action History9
| Date | FY | Mod | Action type | Obligation | Company in company totals |
|---|---|---|---|---|---|
| Apr 23, 2015 | FY2015 | P00008 | C | −$53,430.00 | — |
| Jan 13, 2015 | FY2015 | P00007 | C | −$14,376.25 | — |
| Oct 28, 2014 | FY2015 | P00006 | C | $65,000.00 | — |
| Sep 4, 2014 | FY2014 | P00005 | C | $36,595.00 | — |
| Jan 16, 2014 | FY2014 | 4 | C | $74,750.00 | — |
| Jan 2, 2014 | FY2014 | 3 | G | $0.00 | — |
| Dec 11, 2012 | FY2013 | P00002 | G | $74,750.00 | — |
| Oct 19, 2012 | FY2013 | P00001 | C | $29,250.00 | — |
| Jan 3, 2012 | FY2012 | 0 | — | $74,750.00 | — |
Newest first. Every obligation is shown as reported, including zero and negative (de-obligation) actions. Award lists belong to the company of the latest action; company totals credit each action to the company named on that row, so a note marks rows where the two differ.